Contrast analysis in two-beam laser interference lithography
نویسندگان
چکیده
منابع مشابه
Contrast in four-beam-interference lithography.
Specific configurations of four linearly polarized, monochromatic plane waves have previously been shown to be capable of producing interference patterns exhibiting the symmetries inherent in all 14 Bravais lattices. We present (1) the range of possible absolute contrasts, (2) the conditions for unity absolute contrast, and (3) the types of interference patterns possible for configurations of f...
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ژورنال
عنوان ژورنال: Applied Optics
سال: 2020
ISSN: 1559-128X,2155-3165
DOI: 10.1364/ao.393741